MOS Device including a substrate bias generating circuit

ABSTRACT

An MOS device including a substrate bias generating circuit, comprising: a clock generator for receiving an external clock signal and generating first and second internal clock signals; an internal circuit operated by the first and second internal clock signals; a pumping circuit driver for generating third and fourth internal clock signals in synchronization with the first and second internal clock signals and; a pumping circuit operated by the third and fourth internal clock signals. In this device, when the substrate potential (V BB ) is relatively high, currents flow from the substrate to the pumping circuit.

DESCRIPTION

1. Technical Field

The present invention relates to an MOS integrated circuit and, more particularly, to an MOS device including a substrate bias generating circuit formed in a chip.

2. Background Art

Generally, in an n-type MOS device, a negative bias voltage is applied to the substrate thereof, in order to suppress a source-substrate effect which affects threshold voltage and, in addition, in order to increase the operation speed of the device by decreasing junction capacitances between the substrate and each of the diffusion layers. For this purpose, one external power supply for the negative bias voltage is usually necessary. However, in recent years, a substrate bias generating circuit which is formed in a chip has been provided (Ref. U.S. Pat. No. 3,806,741). An MOS device having such a substrate bias generating circuit therein does not require the above-mentioned external power supply.

Usually, positive charges are generated in the substrate due to leakage currents through the p-n junctions between the substrate and each of the diffusion layers and due to impact ionization. The substrate bias generating circuit comprises a pumping circuit for absorbing such positive charges in the substrate. Thus, the potential of the substrate remains lower than a predetermined value. It should be noted that variation of the substrate potential occurs more or less in association with the operation of internal circuits, such as memory cells, decoders or the like.

However, in one prior art MOS device which includes a substrate bias generating circuit, the pumping operation by the pumping circuit is not in synchronization with the operation of the internal circuits. In this device, the pumping operation may be effected when the substrate potential is low. As a result, the efficiency of pumping is low, since the difference between the substrate potential and the lowest potential of the pumping circuit is small. In another prior art device, the pumping operation by the pumping circuit is independent from the magnitude of the potential of the substrate, even when the pumping operation is in synchronization with the operation of the internal circuits. In this device, the pumping operation may also be effected when the substrate potential is low. In any case, the efficiency of pumping is low and, accordingly, the average level of the substrate potential is relatively high, which invites incomplete isolation between elements, unstable threshold voltages and a low operation speed.

OBJECTS AND SUMMARY OF THE INVENTION

It is an object of the present invention to provide an MOS device including a substrate bias generating circuit with a low average level of the substrate potential.

Accordingly to the present invention, there is provided an MOS device including a substrate bias circuit, comprising: a clock generator for receiving an external clock signal and generating first and second internal clock signals; an internal circuit, connected to the clock generator, which is operated by the internal clock signals; a pumping circuit driver, connected to the clock generator, for receiving the internal clock signals and generating third and fourth internal clock signals which are in synchronization with the internal clock signals and are in opposite phase with each other; and, a pumping circuit, connected to the pumping circuit driver and driven by the third and fourth internal clock signals, for generating a substrate potential, the pumping operation of the pumping circuit being effected when the substrate potential is relatively high. In this device, the pumping efficiency is high; in other words, the quantity of charges flowing from the substrate to the pumping circuit is large since the pumping operation is effected when the substrate potential is high. Accordingly, the average level of the substrate potential can be decreased compared with those of the prior art.

The present invention will be more clearly understood from the description as set forth below with reference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a circuit diagram illustrating a memory cell portion including a sense amplifier of an MOS dynamic memory, for explaining a variation of a substrate potential;

FIG. 2 is a circuit diagram illustrating a decoder portion of the MOS dynamic memory, for explaining another variation of the substrate potential;

FIGS. 3A through 3D are timing diagrams showing the signals appearing in the circuits of FIGS. 1 and 2;

FIG. 4 is a block diagram illustrating an embodiment of the MOS device including a substrate bias generating circuit according to the present invention;

FIG. 5 is a circuit diagram of the pumping circuit driver 43 of FIG. 4;

FIG. 6 is a circuit diagram of the pumping circuit 44 of FIG. 4, and;

FIGS. 7A through 7D are timing diagrams showing the signals appearing in the circuits of FIGS. 4 and 6.

BEST MODE FOR CARRYING OUT THE INVENTION

Referring to FIG. 1, which illustrates a memory cell portion, including a sense amplifier, of an MOS dynamic memory, each of the memory cells MC₀, MC₁, . . . , MC_(i), MC_(i+1), MC_(i+2), . . . , MC_(n), which is of a one-transistor type, comprises a transistor Q and a capacitor C. In addition, dummy cells DC₁ and DC₂ are provided. Since the charge stored in the capacitor C is distributed to floating capacitances of bit lines BL, and BL the resulting difference in potential between the bit lines BL and BL are very small. During standby time, the potential of a clock φ₀ is high, so that the bit lines BL and BL are precharged, while, during a reading operation time, the potential of the clock φ₁ is high, so that data is introduced from a selected memory cell to the bit lines BL and BL and, after that, the data is read out by a sense amplifier SA.

Referring to FIGS. 3A through 3C, the operation of the circuit of FIG. 1 is explained. It is assumed that the content stored in the memory cell MC₀ is read out in synchronization with an external clock signal EXC, as shown in FIG. 3A. In this case, as illustrated in FIG. 3B, the potential of the internal clock signal φ₀ becomes low and, simultaneously, the potentials of a word line W₀ and a dummy word line DW₁ become high. As a result, the transistor Q of the memory cell MC₀ turns on so that the capacitor C is connected to the bit line BL, while a transistor Q_(D1) of the dummy cell DC₁ turns on so that the capacitor C_(D) is connected to the bit lines BL. Therefore, if the charge stored in the capacitor C of the memory cell MC₀ is zero, the potential of the bit line BL becomes low, as illustrated in FIG. 3C. In the sense amplifier SA, the transistors Q_(S1) and Q_(S2) are conductive and non-conductive, respectively. As a result, the charge in the bit line BL flows through the transistor Q_(S1) so that the potential of the bit line BL becomes lower. Therefore, as illustrated in FIG. 3C, the difference in potential between the bit lines BL and BL becomes larger. This difference is detected by a read amplifier (not shown) which means that the read operation for the content in the memory cell MC₀ is completed. After that, the potentials of the word line W₀ and the dummy word line W_(D1) becomes low again and, accordingly, the bit lines BL and BL are again precharged. Such changes of the potentials of the bit lines invite a variation of a substrate potential, since the bit lines are usually formed by diffusion layers in the substrate, and junction capacitances between the diffusion layers and the substrate are large.

FIG. 2 is also a circuit diagram illustrating a decoder portion of the MOS dynamic memory and used for explaining a variation of the substrate potential. In FIG. 2, word lines W₀, W₁, . . . , W_(n) are the same as those of FIG. 1. φ_(W) indicates a power supply for the decoders. The selection of the word lines W₀, W₁, . . . , W_(n) is carried out by address signals A₀, A₁, . . . , A_(m) and their inverted signals A₀, A₁, . . . , A_(m). For example, in a decoder DEC₀, if all the potentials of the address signals A₀, A₁, . . . , A_(m) are low, the transistors Q₁₀, Q₁₁, . . . , Q_(1m) are non-conductive, so that the potential of a signal line L remains high. Therefore, the transistor Q₂₀ is conductive, so that the potential of the word line W₀ is high, which means that a word line W₀ is selected. Contrary to this, if the potential of at least one of the address signals A₀, A₁, . . . , A_(m) is high, the corresponding transistors Q₁₀, Q₁₁, . . . , Q_(1m) conduct so that the potential of the signal line L becomes low. Therefore, the transistor Q₂₀ is non-conductive so that the potential of the word line W₀ is low, which means that the word line W₀ is non-selected. In such decoders DEC₀ , DEC₁, . . . , DEC_(n), the signal line L is precharged by the internal clock signal φ₀, as illustrated in FIG. 3B. For the non-selected state, the potential of the signal line L becomes low and, after that, the signal line L is again precharged by the high potential of the clock signal φ₀. Such a change of the potential of the signal line L also invites a variation of the substrate potential, since the signal line L is usually formed by a diffusion layer in the substrate, and the junction capacitance between the diffusion layer and the substrate is large.

In the MOS dynamic memory, as explained above, changes of the junction capacitances between the substrate and the diffusion layers forming the bit lines BL, BL and, the signal lines L are generated and, similarly, changes of the junction capacitances between the substrate and source or drain diffusion layers are generated. As a result, the substrate potential V_(BB) is changed, as illustrated in FIG. 3D. For example, in a 64K bit dynamic memory using a 5 volt power supply, the variation ΔV_(BB) of the substrate potential V_(BB) is 1 or 2 volts.

There is no problem when the substrate potential V_(BB) is low, but there are various problems when the substrate potential V_(BB) is high. Firstly, the p-n junction between the substrate and source or drain region is forward biased and, accordingly, isolation between the substrate and each of the elements is incomplete. Secondly, the circuit operation becomes unstable when the substrate potential V_(BB) approaches zero, since the variation of a threshold voltage is inversely proportional to a value √|V_(BB) |. Thirdly, when the substrate potential V_(BB) becomes high, junction capacitances between the substrate and each of the diffusion layers also become large, so that the circuit operation becomes slow and unstable.

On the other hand, in the prior art, the pumping operation by the substrate bias generating circuit, which absorbs positive charges from the substrate, is not in synchronization with the operation of internal circuits, such as memory cells or decoders. In this case, the substrate potential V_(BB) is altered responsive to a ratio between the periods A and B, as illustrated in FIG. 3D. For example, if the period B is much longer than the period A, most of the pumping operations may be carried out during the period B, which invites a high average level of the substrate potential V_(BB). In addition, even when the pumping operation is in synchronization with the operation of the internal circuits, it is of no use that the pumping operation is carried out during the period B. Contrary to this, in the present invention, the pumping operation is in synchronization with the operation of the internal circuits and, in addition, the pumping operation is always carried out during the period A.

FIG. 4 is a block diagram illustrating an embodiment of the MOS device including a substrate bias generating circuit according to the present invention. In FIG. 4, a clock generator 41, an internal circuit 42 such as memory cells or decoders, a pumping circuit driver 43 and a pumping circuit 44 are formed in a chip. The clock generator 41 receives an external clock signal EXC as shown in FIG. 7A and generates first and second internal clock signals φ₀ and φ₁, as shown in FIG. 7B, to the internal circuit 42 and the pumping circuit driver 43. The pumping circuit driver 43 delays the internal clock signals φ₀ and φ₁ for a predetermined time and generates third and fourth internal clock signals φ_(A) and φ_(B), as shown in FIG. 7C, which are in opposite phase with each other, and are input to the pumping circuit 44. Therefore, the internal clock signals φ_(A) and φ_(B) are in synchronization with the rising of the internal clock signals φ₁ and φ₀, respectively. In addition, the time delay caused by the pumping circuit driver 43 is determined to be a value which insures that the pumping operation of the pumping circuit 44 is carried out when the substrate potential V_(BB) is high.

FIG. 5 is a circuit diagram of the pumping circuit driver 43 of FIG. 4. The pumping circuit driver 43 comprises a portion 43A for generating the clock signal φ_(A) and a portion 43B for generating the clock φ_(B) signal. Both comprise the same components. Each of the parts 43A and 43B comprises five pairs of series-connected transistors Q₃₁ and Q₃₂, Q₃₃ and Q₃₄, Q₃₆ and Q₃₇, Q₃₈ and Q₃₉, and Q₄₀ and Q₄₁, a transistor Q₃₅ connected between the node P₂ and the gate of the transistor Q₃₆, and a capacitor C₅ connected between the gate and the source of the transistor Q₃₈. Here, the transistor Q₃₄ serves as an element for determining the delay time of the pumping circuit driver 43. For example, in the generating portion 43A, when the potentials of the clock signals φ₀ and φ₁ are high and low, respectively, the transistors Q₃₂, Q₃₃, Q.sub. 36 and Q₃₇ are conductive, while the transistor Q₃₁ is non-conductive. Therefore, the potential at the node P₁ becomes low and the transistor Q₃₄ turns off so that the potential at the node P₂ becomes high. Therefore, the transistors Q₃₉ and Q₄₁ are conductive. On the other hand, since the transistor Q₃₆ is conductive and the potential of the clock signal φ₁ is low, the potential at the node P₃ remains low and, accordingly, the transistors Q₃₈ and Q₄₀ are non-condutive. As a result, the potentials at the nodes P₄ and P₅ are low and, accordingly, the potential of the clock signal φ_(A) is low. Contrary to this, in the generating portion 43B, the potential of the clock signal φ_(B) is high.

Similarly, when the potentials of the clock signals φ₀ and φ₁ are low and high, respectively, the potentials of the clock signals φ_(A) and φ_(B) are high and low, respectively. It should be noted that, when both of the potentials of the clock signals φ₀ and φ₁ are low, the potentials of the clock signals φ_(A) and φ_(B) remain responsive to previous states of the clock signals φ₀ and φ₁. Therefore, the clock signals φ_(A) and φ_(B) are in synchronization with the rising of the clock signal φ₁ and φ₀, respectively (which are not always in opposite phase with each other), and are in opposite phase with each other.

FIG. 6 is a circuit diagram of the pumping circuit 44 of FIG. 4. In FIG. 6, a transistor Q₆₁, a diode D₆ and a capacitor C₆ serves as a pump for absorbing positive charges from the substrate. Transistors Q₆₂ through Q₆₅ are switching elements for charging the capacitor C₆ and operating the above-mentioned pump. Referring to FIG. 7D, the operation of the circuit of FIG. 6 is explained. When the potentials of the clock signals φ_(A) and φ_(B) are high and low, respectively, the transistors Q₆₂ and Q₆₃ are conductive and, accordingly, the transistor Q₆₄ which receives the high potential at the node N₃ is conductive. In addition, the transistors Q₆₅ and Q₆₆ are non-conductive. Therefore, the potential at the node N₁ approaches zero, while the potential at the node N₂ approaches a power supply voltage V_(CC), so that the capacitor C₆ is charged. In this case, since the substrate potential V_(BB) remains negative, no current flows from the substrate to the node N₁.

Next, when the potentials of the clock signals φ_(A) and φ_(B) are changed to low and high, respectively, the transistors Q₆₂ and Q₆₃ turn off and the transistors Q₆₅ and Q₆₆ conduct. As a result, the potential at the node N₃ becomes the same as that at the node N₁ and the transistor Q₆₄ turns off. Therefore, the potential at the node N₂ approaches zero. Since the transistor Q₆₄ is non-conductive, the potential at the node N₁ becomes a negative value. As a result, when the potential at the node N₁ becomes lower than the substrate potential V_(BB), currents flow from the substrate to the node N₁ so that the substrate potential V_(BB) is decreased. In the present invention, when the substrate potential V_(BB) becomes high due to noise associated with the operation of the internal circuit, as illustrated by an arrow X in FIG. 7D, currents begin to flow from the substrate to the node N₁.

In FIG. 7D, if the substrate potential V_(BB) remains low at the time indicated by the arrow X, the substrate potential V_(BB) is lower than the potential at the node N₁ so that no pumping operation is carried out. However, in the present invention, such a phenomenon can rarely happen. Therefore, the efficiency of the pumping operation according to the present invention is high. As explained hereinbefore, the MOS device including a substrate bias generating circuit according to the present invention has such an advantage, as compared with those of the prior art, that the average level of the substrate potential can be decreased, because, when the substrate potential is high, currents flow from the substrate to the substrate bias generating circuit (the pumping circuit). 

I claim:
 1. An MOS device including a substrate bias circuit for controlling the potential on a substrate containing said MOS device, comprising:a clock generator for receiving an external clock signal and generating first and second internal clock signals; a circuit internal to said MOS device connected to said clock generator and operated by said first and second internal clock signals; a pumping circuit driver, connected to said clock generator, for receiving said first and second internal clock signals and generating third and fourth internal clock signals which are in synchronization with said first and second internal clock signals and are in opposite phase with each other; and a pumping circuit connected to said pumping circuit driver and said substrate and driven by said third and fourth internal clock signals, for generating a potential for biasing said substrate when said pumping circuit effectuates a pumping operation, said pumping circuit effecting said pumping operation when the potential on said substrate is higher than a predetermined value.
 2. A device as set forth in claim 1, wherein said internal circuit is a memory cell array including a sense amplifier.
 3. A device as set forth in claim 1, wherein said internal circuit is a decoder circuit.
 4. A device as set forth in claim 1, wherein said pumping circuit comprises:a transistor having first, second and third terminals, said first and second terminals connected to said substrate of said MOS device; a diode operatively connected to said first and third terminals of said transistor; a capacitor having a first terminal operatively connected to said diode and the third terminal of said transistor to form a node and having a second terminal, said transistor, said diode and said capacitor serving as a pump for absorbing positive charges in said substrate; and a plurality of switching transistors operatively connected to said pumping circuit driver and said second terminal of said capacitor for receiving said third and fourth internal clock signals and actuating said pump.
 5. A device as set forth in claim 4, wherein said pump operates only when the potential at said node is less than the potential on said substrate.
 6. A device as set forth in claim 1, 2, 3 or 4, wherein said pumping circuit operates only when said first internal clock signal is at a high potential with respect to said second internal clock signal. 